Hydrogen Plasma Durability of Chemically Treated SnO2Thin Films
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Published:1993-10-01
Issue:Part 2, No. 10A
Volume:32
Page:L1454-L1457
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Kawabata Keishi,Tanaka Takeshi,Hirose Masataka
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering