A Study on Thermal Stability of CoSi2Employing Novel Fine-Grained Polycrystalline Silicon/CoSi2/Si (001) System
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Published:2001-11-15
Issue:Part 1, No. 11
Volume:40
Page:6307-6310
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Bae Jong-Uk,Sohn Dong Kyun,Park Ji-Soo,Han Chang Hee,Park Jin Won,Kim Yeong-Cheol,Kim Jae Jeong
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering