Quantum Yield of Electron-Beam Induced Decomposition of SiO2Overlay on Si in Nanolithography Using a Scanning Tunneling Microscope-Reference-Cited by-同舟云学术

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Quantum Yield of Electron-Beam Induced Decomposition of SiO2Overlay on Si in Nanolithography Using a Scanning Tunneling Microscope

Published:2001-10-15 Issue:Part 1, No. 10 Volume:40 Page:6055-6058
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Ito Tetsuzo,Gotoh Masahide,Sudoh Koichi,Iwasaki Hiroshi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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3. Top-Down Nanomechanical Machining of Three-Dimensional Nanostructures by Atomic Force Microscopy;Small;2010-03-22

4. Fabrication of germanium and silicon nanostructures using a scanning tunneling microscope;Physics-Uspekhi;2006

5. Nanostructures on oxidized Si surfaces fabricated with the scanning tunneling microscope tip under electron-beam irradiation;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2006

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