Chemical Treatment Effects on Si Surfaces in SC2 Solutions Studied by Spectroscopic Ellipsometry

Abstract

Si surfaces chemically treated in HCl:H2O2:H2O= X:1:6 [X=1 (SC2) and 0] at 80°C have been studied using spectroscopic ellipsometry (SE). The SE data clearly indicate that both the X=1 and 0 solutions result in surface chemical oxidation. The chemical oxidation occurs immediately upon immersion of the samples in the solutions. The thickness of chemical oxide shows a saturated value of ∼9.5±1 (X=1) and ∼11.5±1 Å (X=0) against immersion time t.