Zero Additional Process, Local Charge Trap, Embedded Flash Memory with Drain-Side Assisted Erase Scheme Using Minimum Channel Length/Width Standard Complemental Metal–Oxide–Semiconductor Single Transistor Cell
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference5 articles.
1. NROM: A novel localized trapping, 2-bit nonvolatile memory cell
2. A single poly EEPROM cell structure for use in standard CMOS processes
3. Improvement of Read Margin and Its Distribution by $V_{\rm TH}$ Mismatch Self-Repair in 6T-SRAM With Asymmetric Pass Gate Transistor Formed by Post-Process Local Electron Injection
4. Reduction of channel hot-electron-generated substrate current in sub-150-nm channel length Si MOSFET's
5. Injection efficiency of CHISEL gate currents in short MOS devices: physical mechanisms, device implications, and sensitivity to technological parameters
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1. A CMOS-compatible Non-volatile Memory Element using Fishbone-in-cage Capacitor;IPSJ Transactions on System and LSI Design Methodology;2023
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