Investigation and Integration of Polycrystalline Silicon/TiN/SiON Gate Stack in Silicon on Thin Buried Oxide Complementary Metal Oxide Semiconductor Field Effect Transistors
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Published:2012-06-28
Issue:
Volume:51
Page:076504
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Ishigaki Takashi,Tsuchiya Ryuta,Morita Yusuke,Sugii Nobuyuki,Kimura Shinichiro,Iwamatsu Toshiaki,Oda Hidekazu,Inoue Yasuo
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering