Electron Beam Induced Damage of MOS Gate Oxide
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Published:1998-03-30
Issue:Part 1, No. 3B
Volume:37
Page:1129-1136
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Konishi Morikazu,Kubota Michitaka,Koike Kaoru
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering