Characterization of FexSiO (0<x<3) Granular Films by Electron Spin Resonance-Reference-Cited by-同舟云学术

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Characterization of FexSiO (0

Published:1991-10-15 Issue:Part 1, No. 10 Volume:30 Page:2569-2573
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Matsubara Kakuei,Kawamura Koh'ichi,Nagao Keigo,Kadonaga Yasuo,Miki Toshikatsu

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Microstructure characterization of ion-beam synthesized β-FeSi2 phase by transmission electron microscopy;Thin Solid Films;2001-01

2. Electronic structure of β-FeSi2 modified by r.f.-plasma of semiconducting SiH4, GeH4 gas;Thin Solid Films;2001-01

3. Fabrications and Thermoelectric Properties of Semiconducting Iron Disilicides;Tetsu-to-Hagane;1995

4. Point defects and thermoelectric properties of iron disilicide ceramics sintered with SiH4‐plasma‐processed micrograins;Journal of Applied Physics;1994-08-15

5. Thermoelectric Properties of FeSi₂-Base Semiconductors with Ag Addition;Journal of the Japan Institute of Metals;1994

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