Selective Sputtering of Impurity Hydrogen Atoms from a GaN(0001) Surface by Slow Multicharged Ion Impact
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,General Engineering
Link
http://stacks.iop.org/1882-0786/3/i=12/a=126301/pdf
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1. ToF-SIMS characterisation of ultra-thin fluorinated carbon plasma polymer films
2. Three-dimensional projection mask-less patterning (PMLP) of micro-lenses and cones: Monitoring and modelling of ion multi-beam kinetic sputtering in GaAs
3. Surface treatments toward obtaining clean GaN(0001) from commercial hydride vapor phase epitaxy and metal-organic chemical vapor deposition substrates in ultrahigh vacuum
4. Potential sputtering
5. Surface Chemical Analysis Using Multiply Charged Ions
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1. Diagnostics of a spark-discharge coupled to laser aluminum plasma by optical emission spectroscopy and ion time-of-flight;Optics & Laser Technology;2019-04
2. The fundamental surface science of wurtzite gallium nitride;Surface Science Reports;2017-09
3. Highly charged ion scattering on single-crystalline (0001) and zinc-oxide surfaces;Vacuum;2014-06
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