Relationship between Textured Structure of Substrates and Defect Density of Catalytic Chemical Vapor Deposition Amorphous Silicon Films
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference16 articles.
1. Summary of research in NEDO Cat-CVD project in Japan
2. Development of catalytic chemical vapor deposition apparatus for large size substrates
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5. High-stability hydrogenated amorphous silicon films for light-soaking prepared by catalytic CVD at high deposition rates
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1. Estimation of local built-in potential of amorphous silicon thin-film solar cells by Kelvin force microscopy;Japanese Journal of Applied Physics;2016-03-23
2. Local surface potential on hydrogenated microcrystalline silicon films;Japanese Journal of Applied Physics;2015-12-17
3. Local photovoltaic characterization for silicon thin film solar cells using a scanning probe microscope;Journal of Physics: Conference Series;2012-08-07
4. Electron Spin Resonance Observation of Bias-Temperature Stress-Induced Interface Defects at NO/N2O-Annealed Chemical-Vapor-Deposition SiO2/(100) p-Si Substrates;Japanese Journal of Applied Physics;2011-11-01
5. Electron Spin Resonance Observation of Bias-Temperature Stress-Induced Interface Defects at NO/N$_{2}$O-Annealed Chemical-Vapor-Deposition SiO$_{2}$/(100) p-Si Substrates;Japanese Journal of Applied Physics;2011-10-25
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