Gasochromic Properties of Nanostructured Tungsten Oxide Films Prepared by Sputtering Deposition-Reference-Cited by-同舟云学术

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Gasochromic Properties of Nanostructured Tungsten Oxide Films Prepared by Sputtering Deposition

Published:2007-09-20 Issue:9B Volume:46 Page:6315-6318
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Takano Katsuyoshi,Inouye Aichi,Yamamoto Shunya,Sugimoto Masaki,Yoshikawa Masahito,Nagata Shinji

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference9 articles.

1. Gasochromic switching of tungsten oxide films: a correlation between film properties and coloration kinetics

2. Mechanism of the gasochromic coloration of porous WO3 films

3. Examination of the kinetics and performance of a catalytically switching (gasochromic) device

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1. Safety Through Visibility: Tracing Hydrogen in Colors with Highly Customizable and Flexibly Applicable Supraparticle Additives;Advanced Materials Technologies;2024-04-20

2. WO3 Thin-Film Optical Gas Sensors Based on Gasochromic Effect towards Low Hydrogen Concentrations;Materials;2023-05-19

3. Supraparticles for Bare‐Eye H ₂ Indication and Monitoring: Design, Working Principle, and Molecular Mobility;Advanced Functional Materials;2022-02-20

4. Analysis of amorphous tungsten oxide thin films deposited by magnetron sputtering for application in transparent electronics;Applied Surface Science;2021-12

5. Structural and gasochromic properties of WO3films prepared by reactive sputtering deposition;Materials Research Express;2015-01-26

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