Low-Damage and High-Rate Sputtering of Silicon Surfaces by Ethanol Cluster Ion Beam

Author:

Ryuto Hiromichi,Sugiyama Kazumichi,Ozaki Ryosuke,Takaoka Gikan H.

Publisher

IOP Publishing

Subject

General Physics and Astronomy,General Engineering

Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Interaction between water cluster ions and mica surface;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2014-03

2. Characteristics of acetone cluster ion beam for surface processing and modification;Review of Scientific Instruments;2014-02

3. Acetone cluster ion beam irradiation on solid surfaces;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2013-11

4. Irradiation Effects of Ethanol Cluster Ion Beam on Mica Surface;Transactions of the Materials Research Society of Japan;2013

5. Micro-patterning of Si(100) surfaces by ethanol cluster ion beams;Surface and Coatings Technology;2011-11

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