Amorphous Silicon Thin Films Prepared by Hot Wire Cell Method and Its Application to Solar Cells
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/42/i=4R/a=1521/pdf
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Control of micro void fraction and optical band gap in intrinsic amorphous silicon thin films (VHF-PECVD) for thin film solar cell application;Materials Research Bulletin;2014-12
2. A Novel Method to Make Boron-Doped Microcrystalline Silicon Thin Films with Optimal Crystalline Volume Fraction for Thin Films Solar Cell Applications;Journal of Nanoscience and Nanotechnology;2014-12-01
3. Investigation of Structural Disorder Using Electron Temperature in VHF-PECVD on Hydrogenated Amorphous Silicon Films for Thin Film Solar Cell Applications;Journal of Nanoscience and Nanotechnology;2014-10-01
4. Optimization of intrinsic hydrogenated amorphous silicon deposited by very high-frequency plasma-enhanced chemical vapor deposition using the relationship between Urbach energy and silane depletion fraction for solar cell application;Thin Solid Films;2013-11
5. Wide optical bandgap p-type μc-Si:Ox:H prepared by Cat-CVD and comparisons to p-type μc-Si:H;Thin Solid Films;2008-01
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