Monitoring of CF and CF2Number Density by Optical Emission Intensity Corrected using Probe-Measured Plasma Parameters-Reference-Cited by-同舟云学术

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Monitoring of CF and CF2Number Density by Optical Emission Intensity Corrected using Probe-Measured Plasma Parameters

Published:2003-02-15 Issue:Part 1, No. 2A Volume:42 Page:663-667
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Nakano Toshiki,Yanagita Katsushi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/42/i=2R/a=663/pdf

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4. Plasma etching of SiO2 using remote-type pin-to-plate dielectric barrier discharge;Journal of Applied Physics;2008-10-15

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