Effects of Sputtering Parameters on the Formation of Single-Oriented (002) Ti Film on Si
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Published:2005-01-11
Issue:1A
Volume:44
Page:375-376
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Mireba Kazuhiro,Shinkai Satoko,Yanagisawa Hideto,Sasaki Katsutaka,Abe Yoshio
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering