Reverse CoSi2Thermal Stability and Digitized Sheet Resistance Increase of Sub-90 nm Polysilicon Lines
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Published:2005-04-21
Issue:4B
Volume:44
Page:2217-2220
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Lo Cheng-Yao,Peng Yuan-Ching,Chen Yen-Ming,Tu George C.,Lin Shyue-Shyh,Chen Wei-Ming
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering