Full-Chip Implementation of IDEALSmile on 90-nm-Node Devices by ArF Lithography-Reference-Cited by-同舟云学术

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Full-Chip Implementation of IDEALSmile on 90-nm-Node Devices by ArF Lithography

Published:2005-07-26 Issue:7B Volume:44 Page:5526-5534
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Yamazoe Kenji,Cantú Pietro,Capetti Gianfranco,Evangelista Elena,Hasegawa Yasuo,Iwasa Junji,Toublan Olivier,Loi Sara,Lupo Marco,Pepe Annalisa,Kuno Toshihisa,Suzuki Akiyoshi,Saitoh Kenji

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fast computation of constructive and destructive interference areas in partially coherent imaging for resolution enhancement in optical microlithography;Applied Optics;2009-03-03

2. Extension of the 2D-TCC technique to optimize mask pattern layouts;SPIE Proceedings;2008-05-02

3. AltPSM contact hole application at DRAM 4xnm nodes with dry 193nm lithography;Optical Microlithography XXI;2008-03-14

4. Mask optimization for arbitrary patterns with 2D-TCC resolution enhancement technique;Optical Microlithography XXI;2008-03-14

5. Resolution enhancement by aerial image approximation with 2D-TCC;SPIE Proceedings;2007-10-05

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