Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor-Reference-Cited by-同舟云学术

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Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor

Published:2010-05-20 Issue:5 Volume:49 Page:05FA10
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kim Jae-Min,Lee Han-Bo-Ram,Lansalot Clement,Dussarrat Christian,Gatineau Julien,Kim Hyungjun

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference34 articles.

1. Submicron patterning of thin cobalt films for magnetic storage

2. Enhanced magnetic field sensitivity of spin-dependent transport in cluster-assembled metallic nanostructures

3. Giant Magnetoresistive Effects in a Single Element Magnetic Thin Film

4. Design and performance of GMR sensors for the detection of magnetic microbeads in biosensors

5. The effect of magnetic fields on the electrodeposition of cobalt

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