Forty-Five Degree Micromirror Fabrication Using Silicon Anisotropic Etching with Surfactant-Added Tetramethylammonium Hydroxide Solution
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference11 articles.
1. Embodiment of optical interconnection circuits for the mobile phone application
2. Conventional Printed Circuit Board Technology Approach for an Electro-Optical Layer
3. Fabrication of 45° mirrors together with well-defined v-grooves using wet anisotropic etching of silicon
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