Smooth and Vertical Etching of GaAs/GaInP/AlGaInP Using Inductively Coupled Cl2/BCl3/CH4Plasma
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/43/i=12R/a=8304/pdf
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Vertical Cavity With a Chirped Heterostructure Dual-Period High-Contrast Grating;IEEE Photonics Journal;2022-08
2. GaInP nanowire arrays for color conversion applications;Scientific Reports;2020-12
3. Top-Down Fabrication of High Quality Gallium Indium Phosphide Nanopillar/disk Array Structures;2019 IEEE 14th Nanotechnology Materials and Devices Conference (NMDC);2019-10
4. Defect-free etching process for GaAs/AlGaAs hetero-nanostructure using chlorine/argon mixed neutral beam;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-11
5. Two-dimensional AlGaInP∕GaInP photonic crystal membrane lasers operating in the visible regime at room temperature;Applied Physics Letters;2007-01
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