Electron Density Control Using Fast Gas Puffing in Reversed-field Pinch Device, TPE-RX-Reference-Cited by-同舟云学术

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Electron Density Control Using Fast Gas Puffing in Reversed-field Pinch Device, TPE-RX

Published:2004-08-20 Issue:No. 9A/B Volume:43 Page:L1184-L1186
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Sakakita Hajime,Yagi Yasuyuki,Koguchi Haruhisa,Hirano Yoichi,Shimada Toshio,Canton Alessandra M.,Innocente Paolo

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The reversed field pinch;Nuclear Fusion;2021-01-28

2. Magnetic Confinement Fusion—Experimental Physics: Reversed Field Pinches;Encyclopedia of Nuclear Energy;2021

3. Variation of Magnetic Fluctuation due to Gas Puffing in Edge Region of Reversed-Field Pinch Plasma;Journal of the Physical Society of Japan;2016-09-15

4. Potential of Electron Cyclotron Emission as Diagnostic Tool on Reversed-Field Pinch;Japanese Journal of Applied Physics;2006-04-07

5. Reduction of Thermal Wall Load by Gas Puffing in Reversed-Field Pinch Device, TPE-RX;Japanese Journal of Applied Physics;2004-12-09

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