A Novel Silicon-Dioxide Etching Process Employing Pulse-Modulated Electron-Beam-Excited Plasma
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Published:2004-08-12
Issue:No. 9A/B
Volume:43
Page:L1166-L1168
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Takeda Keigo,Tomekawa Yutaka,Iwasaki Masahiro,Ito Masafumi,Ohta Takayuki,Yamakawa Koji,Hori Masaru
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering