Low-Temperature Metalorganic Chemical Vapor Deposition of GaAs on Si by Alternate Gas Flow of the Source Materials
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Published:1992-02-15
Issue:Part 1, No. 2A
Volume:31
Page:225-226
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Fujita Kazuhisa,Kanao Hiroto,Matsuda Yasushi
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering