Absorption Coefficient and Sensitivity of Positive and Negative Resists in the Vacuum Ultraviolet Region-Reference-Cited by-同舟云学术

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Absorption Coefficient and Sensitivity of Positive and Negative Resists in the Vacuum Ultraviolet Region

Published:1992-02-15 Issue:Part 1, No. 2A Volume:31 Page:401-404
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kudo Kazuhiro,Miyazaki Kenzo,Sakai Hirofumi,Iwabuchi Takashi,Mutoh Katsuhiko,Miyata Takeo,Tomiki Tetsuhiko

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Interfacial Chemistry of Poly(methyl methacrylate) Arising from Exposure to Vacuum-Ultraviolet Light and Atomic Oxygen;The Journal of Physical Chemistry A;2010-08-19

2. Industrial processing of polymers by low-pressure plasmas: the role of VUV radiation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1999-05

3. Imaging characteristics of poly(methyl methacrylate) at vacuum ultraviolet wavelengths;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1997-07

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