Error Analysis in Electron Beam Lithography System -Thermal Effects on Positioning Accuracy--Reference-Cited by-同舟云学术

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Error Analysis in Electron Beam Lithography System -Thermal Effects on Positioning Accuracy-

Published:1992-12-30 Issue:Part 1, No. 12B Volume:31 Page:4253-4256
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Ohta Hiroya,Matsuzaka Takashi,Saitou Norio,Kawasaki Katsuhiro,Nakamura Kazumitsu,Kohno Toshihiko,Hoga Morihisa

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Characterization of imprinting polymeric temperature variation with fluorescent Rhodamine B molecule;Microelectronic Engineering;2006-04

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4. X-ray mask distortions during e-beam patterning;Microelectronic Engineering;1998-03

5. Triangular-variable-shaped beams using the cell projection method;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1996-11

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