Sputtered W-Ti Film for X-Ray Mask Absorber-Reference-Cited by-同舟云学术

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Sputtered W-Ti Film for X-Ray Mask Absorber

Published:1992-12-30 Issue:Part 1, No. 12B Volume:31 Page:4210-4214
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Yabe Hideki,Marumoto Kenji,Aya Sunao,Yoshioka Nobuyuki,Fujino Takeshi,Watakabe Yaichiro,Matsui Yasuji

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 24 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fabrication of high resolution x-ray masks using diamond membrane for second generation x-ray lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2003

2. Deposition and Characterization of Ta, TaNxand Ta4B Films for Next-Generation Lithography Mask Applications;Japanese Journal of Applied Physics;2000-12-30

3. Amorphous Refractory Compound Film Material for X-Ray Mask Absorbers;Japanese Journal of Applied Physics;2000-09-15

4. Smooth low-stress sputtered tantalum and tantalum alloy films for the absorber material of reflective-type EUVL;SPIE Proceedings;2000-07-21

5. Characteristics of sputtered TaX absorbers for x-ray mask;SPIE Proceedings;1999-06-25

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