Temperature and Density of CF Radicals in 60 MHz Capacitively Coupled Fluorocarbon Gas Plasma
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference20 articles.
1. Study of C4F8/N2 and C4F8/Ar/N2 plasmas for highly selective organosilicate glass etching over Si3N4 and SiC
2. Kinetics of Radicals in CF4and C4F8Electron Cyclotron Resonance Plasmas
3. Diode laser measurements of CFx species in a low-pressure, high-density plasma reactor
4. Measurements of radical densities in radio‐frequency fluorocarbon plasmas using infrared absorption spectroscopy
5. Oxide etch behavior in a high-density, low-pressure, inductively coupled C2F6 plasma: Etch rates, selectivity to photoresist, plasma parameters, and CFx radical densities
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Progress and perspectives in dry processes for leading-edge manufacturing of devices: toward intelligent processes and virtual product development;Japanese Journal of Applied Physics;2019-05-30
2. Energy partitioning and its influence on surface scatter coefficients within fluorinated inductively coupled plasmas;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2017-09
3. Spatial profiles of interelectrode electron density in direct current superposed dual-frequency capacitively coupled plasmas;Journal of Physics D: Applied Physics;2017-03-10
4. Reactive Ion Etching of Carbon Nanowalls;Japanese Journal of Applied Physics;2011-07-20
5. Reactive Ion Etching of Carbon Nanowalls;Japanese Journal of Applied Physics;2011-07-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3