Growth of Four-fold Grained K3Li2Nb5O15Thin Film Using RF-Magnetron Sputtering-Reference-Cited by-同舟云学术

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Growth of Four-fold Grained K3Li2Nb5O15Thin Film Using RF-Magnetron Sputtering

Published:1999-11-15 Issue:Part 1, No. 11 Volume:38 Page:6483-6486
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Park Sung-Kun,Baek Min-Soo,Bae Seoung-Choon,Kwon Sung-Yeol,Kim Jee-Hyun,Kim Ki-Wan

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electrical properties of Si–LiNbO3 heterostructures grown by radio-frequency magnetron sputtering in an Ar+O2 environment;Thin Solid Films;2014-02

2. Conduction mechanisms in Si-LiNbO3 heterostructures grown by ion-beam sputtering method;Journal of Materials Science;2012-09-28

3. Current–voltage characteristics and impedance spectroscopy of LiNbO3 films grown by RF magnetron sputtering;Journal of Materials Science: Materials in Electronics;2011-09-16

4. Electrical and structural properties of LiNbO3 films, grown by RF magnetron sputtering;Journal of Materials Science: Materials in Electronics;2011-01-23

5. Fabrication, substructure and properties of LiNbO 3 films;SPIE Proceedings;2010-10-08

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