New Low-Temperature Processing of Metalorganic Chemical Vapor Deposition-Bi4Ti3O12Thin Films Using BiOxBuffer Layer-Reference-Cited by-同舟云学术

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New Low-Temperature Processing of Metalorganic Chemical Vapor Deposition-Bi4Ti3O12Thin Films Using BiOxBuffer Layer

Published:1999-01-15 Issue:Part 1, No. 1A Volume:38 Page:127-130
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kijima Takeshi,Matsunaga andHironori

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

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