Fabrication of Photonic Crystals Consisting of Si Nanopillars by Plasma Etching Using Self-Formed Masks-Reference-Cited by-同舟云学术

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Fabrication of Photonic Crystals Consisting of Si Nanopillars by Plasma Etching Using Self-Formed Masks

Published:1999-12-30 Issue:Part 1, No. 12B Volume:38 Page:7253-7256
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Tada Tetsuya,Poborchii Vladimir V.,Kanayama Toshihiko

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Design of an Ultra-Compact and Highly-Sensitive Temperature Sensor Using Photonic Crystal Based Single Micro-Ring Resonator and Cascaded Micro-Ring Resonator;Silicon;2020-05-19

2. Nanoimprinted SU-8 Nanopillars and Hierarchically Branched Nanowires by Anodic Aluminum Oxide Templates and Their Optical Properties;ECS Transactions;2019-12-17

3. High-Sensitive Detection of Electronic Emission through Si-Nanocrystals/Si-Nanocolumnar Structures by Conducting-Probe Atomic Force Microscopy;IEICE Transactions on Electronics;2014

4. Characterization of Local Electronic Transport through Ultrathin Au/Highly-Dense Si Nanocolumnar Structures by Conducting-Probe Atomic Force Microscopy;IEICE Transactions on Electronics;2013

5. Fabrication of Highly Ordered Silicon Nanowire Arrays With Controllable Sidewall Profiles for Achieving Low-Surface Reflection;IEEE Journal of Selected Topics in Quantum Electronics;2011-07

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