Homogeneous TiO2–SiO2Ultralow-Expansion Glass for Extreme Ultraviolet Lithography Evaluated by the Line-Focus-Beam Ultrasonic Material Characterization System-Reference-Cited by-同舟云学术

Homogeneous TiO2–SiO2Ultralow-Expansion Glass for Extreme Ultraviolet Lithography Evaluated by the Line-Focus-Beam Ultrasonic Material Characterization System

Published:2008-07-18 Issue: Volume:1 Page:087002
ISSN:1882-0778
Container-title:Applied Physics Express
language:en
Short-container-title:Appl. Phys. Express

Author:

Kushibiki Jun-ichi,Arakawa Mototaka,Ueda Tetsuji,Fujinoki Akira

Publisher

IOP Publishing

Subject

General Physics and Astronomy,General Engineering

Link

http://stacks.iop.org/1882-0786/1/i=8/a=087002/pdf

Reference17 articles.

1. Characterization and characteristics of a ULE glass tailored for EUVL needs

2. High-precision (<1ppb/°C) optical heterodyne interferometric dilatometer for determining absolute CTE of EUVL materials

3. Measuring and tailoring CTE within ULE glass

4. A Super-Precise CTE Evaluation Method for Ultra-Low-Expansion Glasses Using the LFB Ultrasonic Material Characterization System

5. Evaluation method of TiO/sub 2/-SiO/sub 2/ ultra-low-expansion glasses with periodic striae using the LFB ultrasonic material characterization system

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