Low-Temperature and High-Rate Deposition of SrTiO3Thin Films by RF Magnetron Sputtering-Reference-Cited by-同舟云学术

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Low-Temperature and High-Rate Deposition of SrTiO3Thin Films by RF Magnetron Sputtering

Published:2000-01-15 Issue:Part 1, No. 1 Volume:39 Page:172-177
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kohara Naoki,Yoshida Akihisa,Sawada Taisuke,Kitagawa Masatoshi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Dynamics of STO heteroepitaxial growth by pulsed laser deposition;Journal of Materials Science;2005-10

2. SrTiO[sub 3] Thin Films Deposited by CLCB in Combination with Sol-Gel Processing;Electrochemical and Solid-State Letters;2004

3. Preparation of strontium titanate thin films by mirror-confinement-type electron cyclotron resonance plasma sputtering;Thin Solid Films;2001-06

4. Improvement of Properties of SrTiO3Thin Films Deposited at Low Temperature and High Rate by Sputtering Gas;Japanese Journal of Applied Physics;2000-06-15

5. Characteristics of post-annealed SrTiO3 thin films prepared by mirror-confinement-type ECR plasma sputtering;Science and Technology of Advanced Materials;2000-01

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