Anisotropic Etching of Submicronic Resist Structures by Resonant Inductive Plasma Etching-Reference-Cited by-同舟云学术

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Anisotropic Etching of Submicronic Resist Structures by Resonant Inductive Plasma Etching

Published:1994-10-15 Issue:Part 1, No. 10 Volume:33 Page:6005-6012
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Etrillard Jackie,Francou Jean-Marc,Inard Alain,Henry Daniel

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Resist trimming in high-density CF[sub 4]/O[sub 2] plasmas for sub-0.1 μm device fabrication;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2002

2. Microstructured polymer tips for scanning near-field optical microscopy;Ultramicroscopy;1998-03

3. Discharge disruptions in a helicon plasma source;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1997-11

4. Anisotropic etching of InP with low sidewall and surface induced damage in inductively coupled plasma etching using SiCl4;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1997-05

5. Anisotropic Etching of a Novalak‐Based Polymer at Cryogenic Temperature;Journal of The Electrochemical Society;1997-03-01

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