Reduction of Plasma Damage in Reactive Ion Etching by Means of Suppressing Self-Bias
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Published:1994-07-30
Issue:Part 1, No. 7B
Volume:33
Page:4461-4464
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Ohte Takeo,Aoyama Hidetake,Goto Makoto,Sugawara Minoru
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering