High-Accuracy Defect-Free X-Ray Mask Technology-Reference-Cited by-同舟云学术

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High-Accuracy Defect-Free X-Ray Mask Technology

Published:1994-12-30 Issue:Part 1, No. 12B Volume:33 Page:6878-6887
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Nash Steven C.,Faure Thomas B.,Levin James P.,Puisto Denise M.,Rocque Janet M.,Kimmel Kurt R.,McCord Mark A.,Viswanathan Raman G.

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Monte Carlo study of backscattered electron signals from microstructures of x-ray masks;Optik;2001

2. X-ray mask defect repair optimization;SPIE Proceedings;1999-06-25

3. Electron beam lithography for 0.13 μm manufacturing;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1997-11

4. Extendibility of synchrotron radiation lithography to the sub-100 nm region;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1996-11

5. An overview of X-ray lithography;Microelectronic Engineering;1996-01

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