Improvements of Nanostructure Patterning in X-Ray Mask Making-Reference-Cited by-同舟云学术

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Improvements of Nanostructure Patterning in X-Ray Mask Making

Published:1994-12-30 Issue:Part 1, No. 12B Volume:33 Page:6923-6927
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Chen Yong,Carcenac Frank,Rousseaux Françoise,Launois Huguette

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanofabrication: Conventional and nonconventional methods;ELECTROPHORESIS;2001-01

2. Nanoimprint and micro-contact printing tri-layer processes;The European Physical Journal Applied Physics;2000-12

3. Nanoimprint lithography for a large area pattern replication;Microelectronic Engineering;1999-05

4. Mold-assisted near-field optical lithography;Microelectronic Engineering;1999-05

5. Fabrication of magnetic submicron-wire channels for the investigation of magnetization reversal;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-11

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