0.13 µmPattern Delineation Using KrF Excimer Laser Light-Reference-Cited by-同舟云学术

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0.13 µmPattern Delineation Using KrF Excimer Laser Light

Published:1994-12-30 Issue:Part 1, No. 12B Volume:33 Page:6816-6822
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Imai Akira,Asai Naoko,Ueno Takumi,Hasegawa Norio,Tanaka Toshihiko,Terasawa Tsuneo,Okazaki Shinji

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 0.10 µm Dense Hole Pattern Formation by Double Exposure Utilizing Alternating Phase Shift Mask Using KrF Excimer Laser as Exposure Light;Japanese Journal of Applied Physics;1999-05-15

2. Hierarchical Processing of Levenson-Type Phase Shifter Generation;Japanese Journal of Applied Physics;1997-12-30

3. Technology challenges for integration near and below 0.1 μm;Proceedings of the IEEE;1997-04

4. Thin-film imaging: Past, present, prognosis;IBM Journal of Research and Development;1997-01

5. Analysis of Nonplanar Topography Effects of Phase Shift Masks on Imaging Characteristics;Japanese Journal of Applied Physics;1995-12-30

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