Patterning Accuracy Estimation of Electron Beam Direct-Writing System EX-8D-Reference-Cited by-同舟云学术

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Patterning Accuracy Estimation of Electron Beam Direct-Writing System EX-8D

Published:1994-12-30 Issue:Part 1, No. 12B Volume:33 Page:6966-6970
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Hattori Kiyoshi,Magoshi Shunko,Sunaoshi Hitoshi,Wada Hirotsugu,Ando Atsushi,Yamaguchi Toshio,Mikami Shinji,Nishimura Shinsuke,Housai Hiroaki,Hashimoto Susumu,Yoshikawa Ryoichi,Takigawa Tadahiro

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Advanced electron-beam writing system EX-11 for next-generation mask fabrication;SPIE Proceedings;1999-08-25

2. Patterning accuracy estimation during stage acceleration in the electron beam direct writing system EX-8D;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1996-11

3. Active Vibration Correction in Electron Beam Lithography System;Japanese Journal of Applied Physics;1995-12-30

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