Author:
Arimoto Hiroshi,Takamori Akira,Miyauchi Eizo,Hashimoto Hisao
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
18 articles.
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1. High resolution TEM analysis of focused ion beam amorphized regions in single crystal silicon—A complementary materials analysis of the teardrop method;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-01
2. Current density profile characterization and analysis method for focused ion beam;Microelectronic Engineering;2016-04
3. Apparent beam size definition of focused ion beams based on scanning electron microscopy images of nanodots;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2015-07
4. Probe current distribution characterization technique for focused ion beam;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-11
5. Precise U–Pb zircon dating at a scale of <5 micron by the CAMECA 1280 SIMS using a Gaussian illumination probe;Journal of Analytical Atomic Spectrometry;2011