Experimental Study on the Deposition Profile of the ICRF Power and Electron Thermal Diffusivity-Reference-Cited by-同舟云学术

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Experimental Study on the Deposition Profile of the ICRF Power and Electron Thermal Diffusivity

Published:1989-08-20 Issue:Part 1, No. 8 Volume:28 Page:1468-1473
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Ogawa Yuichi,Ando Ritoku,Kako Eiji,Kawahata Kazuo,Kawasumi Yoshiaki,Morita Shigeru,Watari Tetsuo,Akiyama Ryuichi,Hamada Yasuji,Hirokura Satoru,Masai Kuniaki,Matsuoka Keisuke,Mohri Akihiro,Noda Nobuaki,Ogawa Isamu,Ohkubo Kunizo,Sato Kuninori,Tanahashi Shugo,Taniguchi Yoshiyuki,Toi Kazuo

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Interlayer effects in the newest high-Tc superconductors;Physica C: Superconductivity;1991-09

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