Wet Chemical Etching for Ultrafine Periodic Structure: Rectangular InP Corrugations of 70 nm Pitch and 100 nm Depth-Reference-Cited by-同舟云学术

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Wet Chemical Etching for Ultrafine Periodic Structure: Rectangular InP Corrugations of 70 nm Pitch and 100 nm Depth

Published:1989-10-20 Issue:Part 1, No. 10 Volume:28 Page:2193-2196
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Inamura Etsuko,Miyamoto Yasuyuki,Tamura Shigeo,Takasugi Teruhisa,Furuya Kazuhito

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 24 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Precise Formation of Dovetail Structures for InP-Based Devices;ECS Solid State Letters;2013-03-08

2. GaInAsP/InP Quantum Wire Lasers;IEEE Journal of Selected Topics in Quantum Electronics;2009

3. Active coupled-resonator optical waveguides II Current injection InP-InGaAsP Fabry-Perot resonator arrays;Journal of the Optical Society of America B;2007-08-24

4. Study of ordinary facets revealed in (100) InP by etching in HCl;Materials Science and Engineering: B;2007-03

5. Double-Slit Interference Observation of Hot Electrons in Semiconductors–Analysis of Experimental Data–;Japanese Journal of Applied Physics;2005-05-10

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