Development of a Compact X-ray Source and Super-sensitization of Photo Resists for Soft X-ray Imaging-Reference-Cited by-同舟云学术

Development of a Compact X-ray Source and Super-sensitization of Photo Resists for Soft X-ray Imaging

Published:2009 Issue:3 Volume:22 Page:273-278
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Gowa Tomoko,Fukutake Naoyuki,Hama Yoshimasa,Hizume Kentaro,Kashino Takashi,Kashiwagi Shigeru,Kuroda Ryunosuke,Masuda Akihiko,Ohshima Akihiro,Saito Taku,Sakaue Kazuyuki,Shinohara Kunio,Takashi Tomohiro,Urakawa Tatsuya,Ushida Kiminori,Washio Masakazu

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/22/3/22_3_273/_pdf

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2. 2. S. Kashiwagi, R. Kuroda, T. Oshima, F. Nagasawa, T. Kobuki, D. Ueyama, Y. Hama, M. Washio, K. Ushida, H. Hayano and J. Urakawa, J. Appl. Phys., 98 (2005) 123302.

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4. 4. B. L. Henke, E. M. Gullikson and D. J. Davis, ADNDT, 54 (2) (1993) 181 - 342.

5. 5. J. Kirz, C. Jacobsen and M. Howells, Q Rev Biophys., 28 (1995) 33 - 130.

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