Present Status of EUV Interference Lithography at NewSUBARU-Reference-Cited by-同舟云学术

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Present Status of EUV Interference Lithography at NewSUBARU

Published:2023-06-15 Issue:1 Volume:36 Page:53-59
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Imai Rikuya¹,Yamakawa Shinji¹,Harada Tetsuo¹,Watanabe Takeo¹

Affiliation:

1. Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo

Publisher

Technical Association of Photopolymers, Japan

Link

https://www.jstage.jst.go.jp/article/photopolymer/36/1/36_53/_pdf

Reference13 articles.

1. 1. D. V. Steenwinckel, J. H. Lammers, L. H. A. Leunissen, and J. A. J. M. Kwinten, Proc. SPIE, 5753 (2005) 269.

2. 2. C. Anderson, A. Allezy, W. Chao, L. Conley, C. Cork, W. Cork, R. Delano, J. DePonte, M. Dickinson, G. Gaines, J. Gamsby, E. Gullikson, G. Jones, L. McQuade, R. Miyakawa, P. Naulleau, S. Rekawa, F. Salmassi, B. Vollmer, D. Zehm, W. Zhu, Proc. SPIE, 11323 (2020) 113230B.

3. 3. T. Allenet, M. Vockenhuber, C-K. Yeh, D. Kazazis, J. G. Santaclara, L. van Lent-Protasova, and Y. Ekinci, Proc. SPIE, 11854 (2021) 118540N.

4. 4. E. Buitrago, R. Fallica, D. Fan, W. Karim, M. Vockenhuber, J. A. van Bokhoven, and Y. Ekinci, Proc. SPIE., 9926 (2016) 99260T.

5. 5. J. Zhao, S. Yang, C. Xue, L. Wang, Z. Liang, L. Zhang, Y. Wang, Y. Wu, and R. Tai, Int. J. Extrem. Manuf., 2 (2020) 012005.

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