Functional Resist Materials for Negative Tone Development in Advanced Lithography-Reference-Cited by-同舟云学术

Functional Resist Materials for Negative Tone Development in Advanced Lithography

Published:2012 Issue:1 Volume:25 Page:109-114
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Tarutani Shinji,Fujii Kana,Yamamoto Kei,Iwato Kaoru,Shirakawa Michihiro

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/25/1/25_109/_pdf

Reference11 articles.

1. 1. Shinji Tarutani, Hideaki Tsubaki, Masahiro Yoshidome, Kenji Wada, Wataru Hoshino, Shinichi Kanna, Naoyuki Nishikawa, Kazuyoshi Mizutani, Naoto Ohshima, Koji Shitabatake: 4th International Symposium on Immersion Lithography, (2007) RE-05.

2. 2. Shinji Tarutani, Hideaki Tsubaki, and Shinichi Kanna: Proc. SPIE, 6923, (2008) 69230F.

3. 3. Joost Bekaert, Mireille Maenhoudt, Geert Vandenberghe, Mario Reybrouck: 5th International Symposium on Immersion Lithography Extensions, (2008) O-DS-02.

4. 4. L. Van Look, J. Bekaert, V. Truffert, V. Wiaux, F. Lazzarino, M. Maenhoudt, G. Vandenberghe, Mario Reybrouck, Shinji Tarutani: Proc. SPIE, 7640, (2010) 764069.

5. 5. Kilyoung Lee, Cheolkyu Bok, Jaeheon Kim, Hyunkyung Shim, Junggun Heo, Junghyung Lee, Hyung-Soo Kim, Donggyu Yim and Sung-Ki Park: Proc. SPIE, 7639, (2010) 76391S.

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