1. 1. (a) P. C. Tsiartas, L. L. Simpson, A. Qin, C. G. Willson, R. D. Allen, V. J. Krukonis, P. M. Gallagher-Wetmore, Proc. SPIE-Int. Soc. Opt. Eng., 2438 (1995) 261.
2. (b) L. F. Thompson, C. G. Willson, M. J. Bowden, “Introduction to Microlithography” 2nd Edition; American Chemical Society: Washington, DC, (1994) p197.
3. 2. See, for example, reference 1b, p190.
4. 3. (a) H. Ito, N. Seehof, R. Sato, T. Nakayama, M. Ueda, “Synthesis and evaluation of alicyclic backbone polymers for 193 nm lithography”, in: Micro- and Nanopatterning Polymers; H. Ito, E. Reichmanis, O. Nalamasu, T. Ueno, Eds.; ACS Symposium Series 706, American Chemical Society: Washington, DC, (1998) p208.
5. (b) H. Ito, G. Wallraff, N. Fender, P. J. Brock, C. E. Larson, H. D. Truong, G. Breyta, D. C. Miller, M. H. Sherwood, R. D. Allen, J. Photopolym. Sci. Technol., 14(4) (2001) 583.