A New Photoresist Material for 157 nm Lithography-2.-Reference-Cited by-同舟云学术

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A New Photoresist Material for 157 nm Lithography-2.

Published:2002 Issue:4 Volume:15 Page:643-654
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Fujigaya T.,Ando S.,Shibasaki Y.,Kishimura S.,Endo M.,Sasago M.,Ueda M.

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer1988/15/4/15_4_643/_pdf

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3. The effect of fluorination on chain transfer reactions in the radical polymerization of oligo ethylene glycol ethenesulfonate monomers;Polymer Chemistry;2018

4. Development and Application of Microelectronic Photoresist;PROG CHEM;2014

5. Synthesis of sulfonated organic–inorganic hybrids through the radical copolymerization of vinyl sulfonate esters and vinyl trialkoxysilanes;Reactive and Functional Polymers;2013-04

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