The Performances and Challenges of Today’s EB Lithography and EB-resist Materials-Reference-Cited by-同舟云学术

The Performances and Challenges of Today’s EB Lithography and EB-resist Materials

Published:2014 Issue:4 Volume:27 Page:511-516
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Saito Masato,Ugajin Kunihiro,Yagawa Keisuke,Suenaga Machiko,Kobayashi Yoshihito

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/27/4/27_511/_pdf

Reference3 articles.

1. 1. ITRS. “International Technology Roadmap for semiconductors (ITRS 2012 Update)”. http://www. itrs.net.

2. 2. H. Sunaoshi, Y. Tachikawa, H. Higurashi, T. Iijima, J. Suzuki, T. Kamikubo, K. Ohtoshi, H. Anze, T. Katsumata, N. Nakayamada, S. Hara, S. Tamamushi and Y. Ogawa, Proc. SPIE, 6283 (2006) 628306.

3. 3. S. Yoshitake, T. Kamikubo, N. Nakayamada, K. Hattori, H. Ando, T. Iijima, K.Ohtoshi, K. Saito, R. Yoshikawa, S. Tamamushi, R. Tomiyoshi, H. Higurashi, Y. Hattori, S. Tsuchiya, M. Katoh, K. Suzuki, Y. Tachikawa, M. Ogasawara, V. Katsap, S. D. Golladay, R.A. Kendall, Proc. SPIE, 8166 (2011) 81661D.

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Study of EB resist dissolution contrast and chemical blur impact on the ultimate resolution;Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology;2023-09-29

2. Study of EB resist dissolution contrast and chemical blur impact on the ultimate resolution;Photomask Technology 2022;2022-12-01

3. Evaluation of a Short Microelectromechanical System Process Using a Silicon-on-Insulator Diaphragm and Anodic Bonding;IEEJ Transactions on Sensors and Micromachines;2017

4. EB and EUV lithography using inedible cellulose-based biomass resist material;SPIE Proceedings;2016-03-21

5. Inedible cellulose-based biomass resist material amenable to water-based processing for use in electron beam lithography;AIP Advances;2015-07