Progresses and Challenges of EUV Lithography Materials-Reference-Cited by-同舟云学术

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Progresses and Challenges of EUV Lithography Materials

Published:2014 Issue:5 Volume:27 Page:601-610
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Simone Danilo De,Goethals Anne Marie,Roey Frieda Van,Zheng Tao,Foubert Philippe,Hendrickx Eric,Vandenberghe Geert,Ronse Kurt

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/27/5/27_601/_pdf

Reference25 articles.

1. 1. B. Wua and A. Kumar, J. Vac. Sci. Technol. B 25 (6), Nov/Dec 2007.

2. 2. R. A. Lawson, J. Cheng, A. Cheshmehkani, L. M. Tolbert, C. L. Henderson, Proc. SPIE, 8682 (2013) 868221-2.

3. 3. W. Wu, K. Nuzhdin, M. Vyushkova, I. Janik, D. Bartels, J. Phys. Chem B, 116 (2012) 6215-6224.

4. 4. T. Kozawa and S. Tagawa, J. Photopolym, Sci. Technol,. 24 (2) (2011) 137.

5. 5. H. Tsubaki, S. Tarutani, N. Inoue, H. Takizawa, T. Goto, Proc. SPIE, 8679 (2013) 867905-1.

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