Progress Towards Production Worthy EUV Photoresists: Balancing Litho, Outgassing and OOB Performance-Reference-Cited by-同舟云学术

Progress Towards Production Worthy EUV Photoresists: Balancing Litho, Outgassing and OOB Performance

Published:2014 Issue:5 Volume:27 Page:667-675
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Cameron James,Thackeray James,Jain Vipul,LaBeaume Paul,Coley Suzanne,Ongayi Owendi,Wagner Mike,Biafore John

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/27/5/27_667/_pdf

Reference29 articles.

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2. 2. R. Peeters, EUVL Conference (Toyama), Oct. 2013.

3. 3. A. Mallik, N. Horiguchi, J. B?mmels, A. Thean, K. Barla, G. Vandenberghe, K. Ronse, J. Ryckaert, A. Mercha, L. Altimime, D. Verkest and A. Steegen, Proc. SPIE., 9048 (2014) 90481R-1-12.

4. 4. S. Sivakumar, 2013 Intl. Workshop on EUV Lithography: http://www.euvlitho.com/2013/P1.

5. 5. D. C. Brandt, I. V. Fomenkov, N. R. Farrar, B. La Fontaine, D. W. Myers, D. J. Brown, A. I. Ershov, N. R. B?wering, D. J. Riggs, R. J. Rafac, S. De Dea, R. Peeters, H. Meiling, N. Harned, D. Smith, A. Pirati and R. Kazinczi, Proc. SPIE., 2014, 9048 (2014) 90480C-1-8.

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