Influence of Substrate Materials on Deposition of Plasma-polymerized SiO:CH Particles-Reference-Cited by-同舟云学术

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Influence of Substrate Materials on Deposition of Plasma-polymerized SiO:CH Particles

Published:2017 Issue:3 Volume:30 Page:337-340
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Inoue Yasushi¹,Koike Haruka¹,Aihara Takumi¹,Takai Osamu²

Affiliation:

1. Department of Advanced Materials Science and Engineering, Chiba Institute of Technology

2. Materials and Surface Engineering Research Institute, Kanto Gakuin University

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/30/3/30_337/_pdf

Reference10 articles.

1. 1. O. Takai, A. Hozumi, and N. Sugimoto, J. Non- Crystal. Solids, 218 (1997) 280.

2. 2. N. E. Blanchard, B. Hanselmann, J. Drosten, M. Heuberger, and D. Hegemann, Plasma Proc. Polym., 12 (2015) 32.

3. 3. K. Teshima, H. Sugimura, Y. Inoue, and O. Takai, Langmuir, 19 (2003) 8331.

4. 4. R. Charifou, E. Espuche, F. Gouanve, L. Dubost, and B. Monaco, J. Membrane Sci., 500 (2016) 245.

5. 5. A. Grill and V. Oatel, Appl. Phys. Lett., 79 (2001) 803.

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fabrication of SiO:CH Particle-agglomerated Films by PECVD with Vinyl-group Organosilicon Reactants;Journal of Photopolymer Science and Technology;2022-12-16

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